Mask-less micro pattern generator (마스크리스 마이크로 패턴 생성기)
- Manufacturer Heidelberg Instruments
- Manufacture date 2016
- Model MLA 100
- Location IBS head quarter, C171 Photo-lithography room
- Manager None
PURPOSE
This equipment is used to development for low temperature detectors. It is the lithography solution without mask for wafers and mask.
SPECIFICATION AND PERFORMANCE
The optical system is designed to write structures down to 1 μm at a speed of 50 mm²/min directly into photoresist, without the need for a photo-mask. The elimination of photo-masks from the lithographic process will increase the flexibility and significantly shorten the prototyping or manufacturing cycle. The MLA100 is controlled by an exposure wizard (GUI), which guides the operator through the complete procedure: Load the substrate, select the design and start the exposure. With a footprint of 60 × 75 cm² the MLA100 was designed to fit even into the smallest R&D laboratories, and requires only power and compressed air for operation.